Out on the fab floor, a 300mm wafer sits, waiting for that soft bake to lock in the photoresist profile. One hot spot, one cold zone, and your linewidth control is gone. The line stops. We built this optical wafer processing heater to keep that from happening in the first place.
What actually matters, technically
The unit leans on short-wave infrared (SWIR) quartz emitters, dumping energy straight into the photoresist and substrate—fast, direct, and without fuss. You get wafer-level uniformity held within ±0.1°C across the active area, so those critical bake steps stay inside the thermal budget. It’s cleanroom-compatible from Class 1 to Class 100, and it generates zero particles while it runs. Temperature repeatability holds at ±0.2°C from batch to batch, and the heater keeps turning 24/7 with zero unplanned downtime.
Why it fits the work we do
This heater hits the four thermal pivots we live by: wafer drying, photoresist soft bake and hard bake, packaging underfill and encapsulate curing, and post-clean drying.
In lithography, that tight uniformity keeps CD and profile targets on spec, which means less scrap and fewer reworks. In packaging, the fast ramp shortens the cure window without overshoot, so throughput improves. And because SWIR heats directly instead of heating a chamber, energy use drops.
Here are the details you need
Installation comes down to matching the tool’s mechanical envelope and coolant loops. We provide the interface drawings and connector list to make integration straightforward.
Emitter life is rated to 10,000 hours. After that, output drift can start to impact uniformity unless you plan replacements. So plan the maintenance window ahead of time—don’t wait for it to show up on the floor.